China has just gathered 100,000 national accelerators into a supercluster. The challenge now is for them to work together efficiently.

China has launched in Zhengzhou the Dawning 8000, an artificial intelligence supercluster that, according to Sugon, can integrate 100,000 calculation cards developed in the country. The company presents it as the first Chinese system of this size built around a national infrastructure, from chips and network to storage and cooling. Sugon assures that the project is already connected to the national supercomputing network, although it has not yet published its complete technical specifications. The scale is not enough. The size of the installation does not in itself imply an equivalent leap in computing capacity. In loads that intend to take advantage of thousands of processors, the work must be dividedsynchronize and recompose without communication between nodes ending up consuming a disproportionate part of the time. As the stack grows, so do the points of failure, software complexity, and demands on network and storage. The real challenge begins when those cards have to behave as a single machine. The pending jump. Sugon maintains that the central node has already been optimized for more than 300 applications in about twenty fields, including large models, robotics, automotive, pharmaceutical industry and weather forecasting. The company adds that more than 70 applications have completed deployments at scale of 10,000 cards. These are relevant data to evaluate the maturity of the platform, although the information released does not detail a public load executed with the 100,000 units simultaneously. Autonomy under pressure. Zhengzhou’s bet cannot be separated from the pressure facing the Chinese technology industry. The United States included Sugon in its Entity List in 2019 and has since expanded restrictions on advanced semiconductors and equipment related to high-performance computing. In this scenario, building an infrastructure based on national technology has a value that goes beyond the power achieved. The project fits into China’s effort to expand its own capacity and reduce supply chain dependencies. The figure is not enough. One hundred thousand Chinese accelerators do not automatically equal one hundred thousand comparable Nvidia GPUs. The deployment also does not allow us to affirm that China has left behind its dependence on Western hardware to sustain its artificial intelligence infrastructure. It does demonstrate, according to Sugon, that the country can now build its own systems on an increasingly larger scale. It is not complete autonomy, but it is another step on the path to depending less on foreign suppliers. Images | Sugon In Xataka | Claude has a space in which he manipulates concepts before his final response. And it has surprised Anthropic itself

Particle accelerators to make chips

The photolithography equipment that designs and produces The Dutch Company ASML They are extraordinarily complex. These integrated circuit manufacturing machines have many sophisticated components, but one of the most advanced is, without a doubt, The ultraviolet light source. Its purpose is to generate extreme ultraviolet radiation (UVE) necessary to transport the geometric pattern that contains the design of the chips to the silicon wafer. Very broadly, this light source generates UVE radiation using high power lasers capable of instantly heating tens of thousands of tiny tin drops in a single second until they reach a temperature of half a million Celsius degrees. This interaction produces an extremely hot plasma that emits ultraviolet light with a wavelength of 13.5 nm. It looks like a relatively simple strategy, But it is not at all. In fact, the UVE source is one of ASML’s disruptive components. Pat Gelsinger has joined the Xlight team Interestingly, to manufacture avant -garde semiconductors using integration technology less than 7 Nm it is not essential to use an ultraviolet light source like the one I just described. You can also opt for other approaches. The UVE lithography machine prototype that, according to leaks, He is testing Huawei In its Dongguan Laboratory (China), it uses an LDP type ultraviolet light source (laser induced discharge), and not LPP class (plasma generated by laser) like the one used by ASML. Another option requires using a syncrotron -type particle accelerator to generate ultraviolet radiation. This is the path that is following the Chinese Academy of Sciences in The installation that is putting up in Beijing (China). Your heps (High Energy Photon Source or source of high -energy photons) has been designed for Deliver High Power UVE Light simultaneously to several integrated circuit manufacturing plants. However, this is not all. There is at least another option that is also being explored to generate the UVE light. Your plan consists in replacing the ultraviolet light source that ASML uses with a free electrons laser It is precisely the strategy for which the American company Xlight, to which Pat Gelsinger has just addedthe former director general of Intel, as executive president and the Organization for high energy physics with accelerators of Tsukuba (Japan). Of course, each of these organizations works on their own. Whatever your plan consists of replacing the ultraviolet light source that uses ASML with a free or fel electron laser for its English denomination (Free-electron laser) as those used in particle accelerators. In fact, in their tests they are using a fel laser generated by a linear accelerator of energy recovery. In theory the radiation delivered by a Fel laser allows to manufacture integrated circuits with a resolution comparable to that of an ultraviolet light source. A priori sounds good, but it seems reasonable to accept that a fel laser linked to a particle accelerator is not exactly cheap. The reason why some technicians prefer this option to which ASML uses is that a single linear accelerator of energy recovery is able to simultaneously feed several lithography machines. In addition, according to Xlight its Fel laser is designed to feed the next generation of ASML photolithography equipment. In fact, in theory it is four times more powerful than the light source used by this Dutch company in its most advanced machines. According to Gelsinger Xlight technology allows the price to be reduced by wafer by 50% and will achieve a higher wafer performance than current solutions. It sounds good, but we will have to wait until 2028 to know if this proposal is really up to expectations. That year Xlight and ASML hope to try their first Fel laser prototype with a lithography team. Image | Xight More information | Xight In Xataka | TSMC acknowledges that it has been considered taking its factories out of Taiwan. It is impossible for a good reason

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